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1. Initiated chemical vapor deposition of polymeric thin films : mechanism and applications

Chan, Kelvin, Ph. D. Massachusetts Institute of Technology,

Initiated chemical vapor deposition (iCVD) is a novel technique for depositing polymeric thin films. It is able to deposit thin films of application-specific polymers in one step without using any sol...

complete descriptionweight 7593

2. Novel multiphase chemical reaction systems enabled by microfabrication technology

Losey, Matthew W,

Advances in MEMS (micro-electromechanical systems) have enabled some of the "Lab-on-a-Chip" technologies and microfluidics that are pervasive in many of the current developments in analytical chemistr...

complete descriptionweight 7591

3. Acoustic emulsions of liquid, near-critical carbon dioxide and water : application to synthetic chemistry through reaction engineering

Timko, Michael T., 1974-,

Supervised by The need to eliminate hazardous solvents, such as methanol, toluene, and dichloromethane, in specialty and pharmaceutical chemical synthesis applications has motivated the development of...

complete descriptionweight 7591

4. Mechanistic studies on chemical instabilities of recombinant proteins

Pan, Bin, Ph. D. Massachusetts Institute of Technology,

Protein molecules are being widely used as pharmaceuticals for treating diseases ranging from diabetes and haemophilia to various types of cancers due to their great potency and specificity. However, ...

complete descriptionweight 7591

5. Decision support tools for environmentally conscious chemical process design

Cano Ruiz, José Alejandro, 1969-,

The environment has emerged as an important determinant of the performance of the modern chemical industry. Process engineering in the 21st century needs to evolve to include environmental issues as p...

complete descriptionweight 7591

6. Development of Vapour Liquid Equilibrium Calculation Methods for Chemical Engineering Design

Pokki, Juha-Pekka,

This thesis deals with the development of computational methods for vapour liquid equilibrium (VLE) and volumetric properties. The VLE in this thesis can be divided into the low- and medium-pressure V...

complete descriptionweight 7591

7. Complementary computational chemistry and surface science experiments of reaction pathways in aluminum chemical vapor deposition Complementary quantum chemistry calculations and surface science experiments of reaction pathways in aluminum chemical vapor deposition

Willis, Brian G,

Continued advances in the semiconductor industry will require the introduction of new materials and processes concurrent with shrinking device dimensions. These simultaneous demands drastically reduce...

complete descriptionweight 7590

8. Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics

Pryce Lewis, Hilton G. (Hilton Gavin), 1973-,

Organosilicon thin films deposited by pulsed plasma-enhanced chemical vapor deposition (PPECVD) and hot-filament chemical vapor deposition (HFCVD) were investigated as potential biopassivation coating...

complete descriptionweight 7589

9. Building robust chemical reaction mechanisms : next generation of automatic model construction software

Song, Jing, 1972-,

Building proper reaction mechanisms is crucial to model the system dynamic properties for many industrial processes with complex chemical reaction phenomena. Because of the complexity of a reaction me...

complete descriptionweight 7589

10. Photoinitiated chemical vapor depostion [sic] : mechanism and applications Photoinitiated chemical vapor deposition : mechanism and applications

Baxamusa, Salmaan Husain,

Photoinitiated chemical vapor deposition (piCVD) is developed as a simple, solventless, and rapid method for the deposition of swellable hydrogels and functional hydrogel copolymers. Mechanistic exper...

complete descriptionweight 7589
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